Structural and Electrical Behavior of Swift Heavy Ion Irradiated Hafnium Oxide Polymorphs in Ferroelectric and Resistive Memories

Schreyer, Philipp Lehninger, David Vogel, Tobias Zhang, Tianren Kim, Taewook Piros, Eszter Li, Yingxin Duan, Yu Lederer, Maximilian Seidel, Konrad Trautmann, Christina Toimil Molares, Maria Eugenia Alff, Lambert

MAT

Advanced electronic materials

Wiley-VCH Verlag GmbH & Co. KG

Weinheim

2199-160X

10.1002/aelm.202500631

e00631 21 11 This is an open access article under the terms of the Creative Commons Attribution License 4. ; PUB:(DE-HGF)16, ; 0, ;

WOS:001631761200001

Journal Article

2025

GSI-2026-00311

2025

https://repository.gsi.de/record/364942 https://doi.org/10.1002/aelm.202500631 <Go to ISI>://WOS:001631761200001